Ti source precursors for atomic layer deposition of TiO2, STO and BST

ECS Transactions

Volumn 16, Issue 4, 2009, Pages 113-122

  Katamreddy, Rajesh ^a   Omarjee, Vincent ^a   Feist, Benjamin ^a   Dussarrat, Christian ^a  

^a AIR LIQUIDE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; GROWTH RATE; OXIDE MINERALS; PHOTOELECTRON SPECTROSCOPY; TITANIUM DIOXIDE;

AMINO-COMPOUNDS; DEPOSITION PROCESS; NARROW PROCESS WINDOWS; PRECURSOR DECOMPOSITION; PROCESS TEMPERATURE; TETRAKIS; UPPER LIMITS;

ATOMIC LAYER DEPOSITION;

EID: 63149169902     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2979986     Document Type: Conference Paper

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