A process of glassy carbon etching without the micro masking effect for the fabrication of a mold with a high-quality surface

Journal of Micromechanics and Microengineering

Volumn 19, Issue 12, 2009, Pages

  Youn, Sung Won ^a   Ueno, Akihisa ^a   Takahashi, Masaharu ^a   Maeda, Ryutaro ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCH PROFILE; ETCH RATES; ETCHED SURFACE; ETCHING GAS; GLASSY CARBON; HIGH QUALITY; HIGH TEMPERATURE; IMPRINT LITHOGRAPHY; MASKING EFFECT; MOLD MATERIALS; SMOOTH ETCH; SMOOTH SURFACE; SURFACE QUALITIES; THERMAL STABILITY;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; GLASS; MOLDS; REACTIVE ION ETCHING;

SURFACE PROPERTIES;

EID: 70450178055     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/12/125010     Document Type: Article

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