Fabrication of antireflection structures on glassy carbon surfaces using electron beam lithography and oxygen dry etching

Journal of Physics: Conference Series

Volumn 106, Issue 1, 2008, Pages

  Taniguchi, Jun ^a   Yamauchi, Eiki ^a   Nemoto, Yoshimi ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 44649164466     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/106/1/012011     Document Type: Article

References (6)

1. Ganesha S H, Nagendra C L, Annapurna M N, Ajith Kumar S and Thutupalli G K M 1997 Appl. Opt. 36 6339
2. Kanamori Y, Sasaki M and Hane K 1999 Opt. Lett. 24 1422
3. Katsumura M, Sato M, Hashimoto K, Hosoda Y, Kasono O, Kitahara H, Kobayashi M, Iida T and Kuriyama K I 2005 Japan. J. Appl. Phys. 44 3578
4. Lister K A, Casey B G, Dobson P S, Thoms S, Macintyre D S, Wilkinson C D W and Weaver J M R 2004 Microelectronic Eng. 73 319
5. Wehner G K and Hajicek D J 1971 J. Appl. Phys. 42 1145
6. Gittleman J I and Sichel E K 1979 Appl. Phys. Lett. 35 742