Directly patterning metal films by nanoimprint lithography with low-temperature and low-pressure

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 893-896

  Chen, H L ^a   Chuang, S Y ^a   Cheng, H C ^b   Lin, C H ^b   Chu, T C ^c  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^c YUANPEI UNIVERSITY   (Taiwan)

Author keywords

Metal polymer bi layer structure; Mold; Nanoimprint lithography; Optical grating

Indexed keywords

HIGH PRESSURE EFFECTS; LOW TEMPERATURE EFFECTS; POLYMERS; SURFACE ACTIVE AGENTS;

METAL/POLYMER BI-LAYER STRUCTURE; NANOIMPRINT LITHOGRAPHY; OPTICAL GRATING;

NANOTECHNOLOGY;

EID: 33646051989     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.095     Document Type: Article

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