Effects of substrate cooling during sputter deposition of hydrogen-containing Ta2O5 thin films in H2O atmosphere on their ion conductivity

Japanese Journal of Applied Physics

Volumn 47, Issue 9 PART 1, 2008, Pages 7269-7271

  Abe, Yoshio ^a   Peng, Fei ^a   Takiguchi, Yasuhiro ^a   Kawamura, Midori ^a   Sasaki, Katsutaka ^a   Itoh, Hidenobu ^a   Suzuki, Tsutomu ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Ion conductivity; Proton conducting solid electrolyte; Reactive sputtering; Tantalum oxide

Indexed keywords

CONDUCTIVE FILMS; COOLING; DESORPTION; ELECTROLYTES; EVAPORATIVE COOLING SYSTEMS; HYDROGEN; HYDROSTATIC PRESSURE; IONS; PROTONS; REACTIVE SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; SUBSTRATES; TANTALUM; TANTALUM COMPOUNDS; THICK FILMS; THIN FILMS; TRANSITION METALS; VAPOR PRESSURE; WATER VAPOR;

ATOMIC RATIOS; CHEMICAL COMPOSITIONS; DESORPTION RATES; EQUILIBRIUM VAPOR PRESSURES; FORWARD SCATTERINGS; GROWING FILMS; HYDROGEN CONTENTS; ION CONDUCTIVITIES; ION CONDUCTIVITY; MAXIMUM RATIOS; ROOM TEMPERATURES; RUTHERFORD BACKSCATTERINGS; SUBSTRATE TEMPERATURES; TANTALUM OXIDE; EQUILIBRIUM VAPORS; PRESSURE OF WATERS; PROTON-CONDUCTING SOLID ELECTROLYTE;

SOLID ELECTROLYTES;

EID: 55149107404     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.7269     Document Type: Article

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