Detection of the standing X-ray wavefield intensity inside a thin crystal using back-diffraction topography and imaging

Journal of Applied Crystallography

Volumn 42, Issue 6, 2009, Pages 999-1003

  Honnicke, Marcelo Goncalves ^a   Cusatis, Cesar ^b  

^a BROOKHAVEN NATIONAL LABORATORY   (United States)

^b FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

Author keywords

Standing X ray wavefield intensity; X ray back diffraction; X ray topography

Indexed keywords

EID: 70449853433     PISSN: 00218898     EISSN: 16005767     Source Type: Journal    
DOI: 10.1107/S0021889809040199     Document Type: Article

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