Design and application of a metal wet-etching post-process for the improvement of CMOS-MEMS capacitive sensors

Journal of Micromechanics and Microengineering

Volumn 19, Issue 10, 2009, Pages

  Tsai, Ming Han ^a   Sun, Chih Ming ^a   Liu, Yu Chia ^a   Wang, Chuanwei ^b   Fang, Weileun ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b PIXART IMAGING INC   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVE SENSOR; CMOS PROCESSS; CMOS-MEMS; CMOS-MEMS ACCELEROMETER; DESIGN AND APPLICATION; DIELECTRIC LAYER; DIELECTRIC STRUCTURE; IN-PLANE; METAL LAYER; MICROMECHANICAL STRUCTURES; OUT-OF-PLANE; OUT-OF-PLANE DIRECTION; PARASITIC CAPACITANCE; PLATE-TYPE; POST PROCESS; POST-CMOS; SACRIFICIAL LAYER; SENSING ELECTRODE; SENSOR DESIGNS; STANDARD CMOS PROCESS; THREE AXIS ACCELEROMETERS; THREE-AXIS;

ACCELEROMETERS; DESIGN; ELECTRODES; ETCHING; MEMS; MICROELECTROMECHANICAL DEVICES; OPTICAL SENSORS;

PROCESS DESIGN;

EID: 70350686616     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/10/105017     Document Type: Article

References (11)

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