Optimization of polishing parameters with taguchi method for LBO crystal in CMP

Journal of Materials Science and Technology

Volumn 25, Issue 5, 2009, Pages 703-707

  Li, Jun ^a,b   Zhu, Yongwei ^a   Zuo, Dunwen ^a   Zhu, Yong ^b   Chen, Chuangtian ^b  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

^b TECHNICAL INSTITUTE OF PHYSICS AND CHEMISTRY   (China)

Author keywords

Chemical mechanical polishing (CMP); Lithium triborate (LBO) crystal; Material removal rate (MRR); Surface roughness; Taguchi method

Indexed keywords

ABRASIVE CONCENTRATION; CHEMICAL MECHANICAL POLISHING (CMP); LBO CRYSTAL; LITHIUM TRIBORATE; LITHIUM TRIBORATE (LBO) CRYSTAL; MATERIAL REMOVAL RATE; MATERIAL REMOVAL RATE (MRR); OPTIMAL CONDITIONS; POLISHING PARAMETERS; POLISHING PRESSURE;

ABRASIVES; CHEMICAL MECHANICAL POLISHING; CONCENTRATION (PROCESS); LITHIUM; METAL ANALYSIS; NANOTECHNOLOGY; OPTIMIZATION; POLISHING; SURFACE PROPERTIES; SURFACE ROUGHNESS; TAGUCHI METHODS; VELOCITY;

CHEMICAL POLISHING;

EID: 70350600093     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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