Removal of scratch on the surface of MgO single crystal substrate in chemical mechanical polishing process

Applied Surface Science

Volumn 254, Issue 15, 2008, Pages 4856-4863

  Kang, R K ^a   Wang, K ^a   Wang, J ^b   Guo, D M ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

Chemical mechanical polishing; MgO single crystal; Scratch; Substrate; Surface roughness

Indexed keywords

CHEMICAL MECHANICAL POLISHING; ETCHING; MAGNESIUM COMPOUNDS; PHOSPHORIC ACID; SILICA; SURFACE ROUGHNESS;

COLLOIDAL SILICA PARTICLES; MGO SUBSTRATE SURFACE; POLISHING PAD HARDNESS; SCRATCH;

SINGLE CRYSTAL SURFACES;

EID: 42749089295     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.01.150     Document Type: Article

References (13)

1. B.H. Moeckly S.E. Russek D.K. Lathrop R.A. Buhrman J. Li J.W. Mayer Appl. Phys. Lett. 57 1990 1687
2. D.K. Aswala K.P. Muthe S. Tawde S. Chodhury N. Bagkar A. Singh S.K. Gupta J.V. Yakhmi J. Cryst. Growth 236 2002 661
3. E.E. Mitchell S. Gnanarajan K.L. Green C.P. Foley Thin Solid Films 437 2003 101
4. K. Wang R.K. Kang Z.J. Jin N.H. Wang Key Eng. Mater. 329 2007 225
5. D. Zhigang K. Renke G. Dongming J. Zhuji Proceedings of the 7th ICFDM2006 International Conference on Frontiers of Design and Manufacturing 2006 439
6. W.J. Patrick W.L. Guthrie C.L. Standley P.M. Schiable J. Electrochem. Soc. 138 1991 1778
7. Z. Lu S.-H. Lee I S.V. Babu E. Matijeví J. Colloid Interface Sci. 261 2003 55
8. M. Forsberg Microelectron. Eng. 77 2005 319
9. H. Zhu L.A. Tessaroto R. Sabia V.A. Greenhut M. Smith D.E. Niesz Appl. Surf. Sci. 236 2004 120
10. J. Griffin M. Spencer G. Harris J. Comas IEEE Trans. Electron Devices ED-31 1984 1096
11. N.-H. Kim P.-J. Ko G.-W. Choi Y.-J. Seo W.-S. Lee Thin Solid Films 504 2006 166
12. http://www.lasurface.com/accueil/index.php .
13. http://srdata.nist.gov/xps/elm_comp_res.asp .