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Volumn 18, Issue 1, 2001, Pages 20-28

Application of an adaptive neuro-fuzzy inference system for the optimal analysis of chemical-mechanical polishing process parameters

Author keywords

Adaptive neuro fuzzy inference system (ANFIS); Chemical mechanical polishing (CMP); Neuro fuzzy

Indexed keywords

ADAPTIVE ALGORITHMS; ADAPTIVE SYSTEMS; CHEMICAL MECHANICAL POLISHING; FUZZY CONTROL; INFERENCE ENGINES; MACHINING; NEURAL NETWORKS; OPTIMIZATION; PARAMETER ESTIMATION; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE ROUGHNESS;

EID: 0034802832     PISSN: 02683768     EISSN: None     Source Type: Journal    
DOI: 10.1007/s001700170090     Document Type: Article
Times cited : (20)

References (7)
  • 4
    • 0004172529 scopus 로고    scopus 로고
    • A study of chemical mechanical polishing on silicon wafer
    • Report, Industrial Technology Research Institute, Hsin-Chu, Taiwan, R. O. C.
    • (1996)
    • Kung, C.Y.1    Dai, B.T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.