Calculated sheath dynamics under the influence of an asymmetrically pulsed dc bias

Physical Review E - Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics

Volumn 66, Issue 5, 2002, Pages 9-

  Barnat, E V ^a,b   Lu, T M ^a,b  

^a Astronomyand the Center for Integrated Electronics   (United States)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOLTZMANN TREATMENT; ENERGY DISTRIBUTION; ENERGY SPECTRUM; IONIC FLUXES;

CARRIER CONCENTRATION; CHARGED PARTICLES; CONCENTRATION (PROCESS); IONS; MATHEMATICAL MODELS; POISSON EQUATION; THIN FILMS;

PLASMA SHEATHS;

ARTICLE;

EID: 33646971380     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.66.056401     Document Type: Article

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