Crystalline nanoscale M203 (M = Gd, Nd) thin films grown by molecular beam epitaxy on Si(111)

Materials Transactions

Volumn 50, Issue 8, 2009, Pages 2115-2117

  Wang, Jinxing ^a   Liu, Tianmo ^a   Wang, Zhongchang ^b  

^a CHONGQING UNIVERSITY   (China)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Crystal structure; Gd2O3nd2O 3; Molecular beam epitaxy

Indexed keywords

BIXBYITE STRUCTURE; GD2O3ND2O 3; IN-PLANE DIRECTION; NANO SCALE; ORIENTATION RELATIONSHIP; SI (1 1 1); SI SUBSTRATES; SI(111) SUBSTRATE; SINGLE ORIENTATIONS; THREE-FOLD SYMMETRY; UNIT CELLS;

CELL MEMBRANES; CRYSTAL GROWTH; CRYSTAL ORIENTATION; GADOLINIUM; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; NANOSTRUCTURED MATERIALS; NEODYMIUM; SEMICONDUCTOR QUANTUM WIRES; SILICON; SUBSTRATES; THIN FILMS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 70350116344     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.M2009147     Document Type: Article

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