Impact of oxygen supply during growth on the electrical properties of crystalline Gd2O3 thin films on Si(001)

Applied Physics Letters

Volumn 88, Issue 15, 2006, Pages

  Czernohorsky, M ^a   Bugiel, E ^a   Osten, H J ^a   Fissel, A ^a   Kirfel, O ^a  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DIELECTRIC PROPERTIES; LEAKAGE CURRENTS; MOLECULAR BEAM EPITAXY; OXYGEN SUPPLY; SILICON; THIN FILMS;

DIELECTRIC GATE STACK PROPERTIES; OXIDE THICKNESS; OXYGEN PARTIAL PRESSURES;

GADOLINIUM COMPOUNDS;

EID: 33646150430     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2194227     Document Type: Article

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