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Volumn 278, Issue 1-4, 2005, Pages 638-642

Thin single-crystal Sc2O3 films epitaxially grown on Si (1 1 1) - Structure and electrical properties

Author keywords

A3.Epitaxially grown; A3.MBE; B1.Sc2O3

Indexed keywords

EPITAXIAL GROWTH; LEAKAGE CURRENTS; MOLECULAR BEAM EPITAXY; OSCILLATIONS; OXIDES; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICON COMPOUNDS; SINGLE CRYSTALS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 21044449572     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.12.084     Document Type: Conference Paper
Times cited : (25)

References (6)
  • 4
    • 18444390766 scopus 로고    scopus 로고
    • M. Hong, A.R. Kortan, J. Kwo, H.Y. Lee, Y.F. Hsieh, C.P. Chen, Y.L. Huang, unpublished results, 2004
    • M. Hong, A.R. Kortan, J. Kwo, H.Y. Lee, Y.F. Hsieh, C.P. Chen, Y.L. Huang, unpublished results, 2004.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.