MBE growth and properties of epitaxial metal oxides for high-κ dielectrics

Journal of Crystal Growth

Volumn 278, Issue 1-4, 2005, Pages 18-24

  Osten, H Jörg ^a   Bugiel, E ^a   Kirfel, O ^b   Czernohorsky, M ^b   Fissel, A ^b  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^b Information Technology Laboratory   (Germany)

Author keywords

A3. Molecular beam epitaxy; B1. Oxides; B1. Rare earth compounds; B2. Dielectric materials

Indexed keywords

DIELECTRIC MATERIALS; EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; PHOTOLITHOGRAPHY; POTASSIUM; RARE EARTH ELEMENTS; SILICATES;

AGGRESSIVE REDUCTION; EPITAXIAL METAL OXIDES; RARE-EARTH COMPOUNDS; SILICON SURFACES;

MOS DEVICES;

EID: 18444396643     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.12.051     Document Type: Conference Paper

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