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Volumn 486, Issue 1-2, 2009, Pages 515-520

Structures, mechanical properties and thermal stability of TiN/SiNx multilayer coatings deposited by magnetron sputtering

(6) An, T a,b Wen, M b Wang, L L a Hu, C Q b Tian, H W b Zheng, W T b

a CHANGCHUN UNIVERSITY (China)

b Jilin University (China)

Author keywords

Interfacial structure; Mechanical properties; Thermal stability; TiN SiNx multilayer coatings

Indexed keywords

ANNEALING TREATMENTS; AS-DEPOSITED MULTILAYERS; HIGH THERMAL STABILITY; INTERFACE STRAIN; INTERFACIAL STRUCTURE; MAXIMUM VALUES; MODULATION PERIOD; MULTI-LAYER-COATING; NANOINDENTATION EXPERIMENTS; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; QUANTUM TRAPPING; REACTIVE MAGNETRON SPUTTERING; SINGLE LAYER FILMS; THERMAL STABILITY; TIN LAYERS; TIN/SINX MULTILAYER COATINGS; X RAY REFLECTIVITY;

ANNEALING; COMPRESSIVE STRESS; HARDNESS; MAGNETRONS; MODULATION; MULTILAYERS; SILICON NITRIDE; STRUCTURAL PROPERTIES; TENSILE STRESS; THERMODYNAMIC STABILITY; TITANIUM COMPOUNDS; TITANIUM NITRIDE; VACUUM DEPOSITED COATINGS; VACUUM FURNACES; X RAY DIFFRACTION;

MECHANICAL PROPERTIES;

EID: 70350100474 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2009.06.194 Document Type: Article

Times cited : (30)

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