Interfacial intermixing of TiN/Si3N4 super-hard multilayer films studied by fluorescence x-ray absorption fine structure

Journal of Physics D: Applied Physics

Volumn 39, Issue 13, 2006, Pages 2796-2802

  Pan, Zhiyun ^a   Sun, Zhihu ^a   Xie, Zhi ^a   Xu, Junhua ^b   Kojima, Isao ^b   Wei, Shiqiang ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLIZATION; FILM GROWTH; FLUORESCENCE; MAGNETRON SPUTTERING; SILICON COMPOUNDS; SOLID SOLUTIONS; TITANIUM NITRIDE; X RAY DIFFRACTION;

GROWTH TEMPERATURE; INTERFACIAL INTERMIXING; MULTILAYER FILMS; X-RAY ABSORPTION;

MULTILAYERS;

EID: 33745315611     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/13/024     Document Type: Article

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