Influence of nanocrystal growth kinetics on interface roughness in nickel-aluminum multilayers

Applied Physics Letters

Volumn 83, Issue 26, 2003, Pages 5437-5439

  Aurongzeb, D ^a   Holtz, M ^a   Daugherty, M ^b   Berg, J M ^b   Chandolu, A ^b   Yun, J ^b   Temkin, H ^b  

^a TEXAS TECH UNIVERSITY   (United States)

^b Texas Tech University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SOLID-STATE REACTIONS; X-RAY REFLECTIVITY (XRR);

ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; DIFFERENTIAL SCANNING CALORIMETRY; ELECTRON BEAMS; EVAPORATION; GRAIN BOUNDARIES; GROWTH KINETICS; HIGH TEMPERATURE EFFECTS; MELTING; METALLIC FILMS; NANOSTRUCTURED MATERIALS; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

MULTILAYERS;

EID: 0942299486     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1637155     Document Type: Article

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