Experimental investigation of silicon surface migration in low pressure nonreducing gas environments

Electrochemical and Solid-State Letters

Volumn 12, Issue 12, 2009, Pages

  Kant, Rishi ^a   Ferralis, Nicola ^b   Provine, J ^a   Maboudian, Roya ^b   Howe, Roger T ^a  

^a Stanford University   (United States)

^b University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT GAS; EXPERIMENTAL INVESTIGATIONS; GAS AMBIENTS; GAS ENVIRONMENT; LOW PRESSURES; MICROFABRICATED; MIGRATION RATES; NOBLE GAS; PRESSURE DEPENDENCE; SILICON SURFACES;

ARGON; HELIUM; NEON; VACUUM;

INERT GASES;

EID: 70350077818     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3236781     Document Type: Article

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