Ultraviolet-curing mechanism of porous-SiOC

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 17-19, 2007, Pages

  Ushio, Jiro ^a   Ohno, Takahisa ^a   Hamada, Tomoyuki ^b   Nakao, Shin Ichi ^c   Yoneda, Katsumi ^c   Kato, Manabu ^c   Kobayashi, Nobuyoshi ^c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^c SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Curing; Density functional theory; Dielectric constant; Infrared spectrum; Low k; Molecular dynamics; Structure; Ultraviolet

Indexed keywords

CURING; DENSITY FUNCTIONAL THEORY; MOLECULAR DYNAMICS; PERMITTIVITY;

INFRARED SPECTRUM; UV CURING;

POROUS MATERIALS;

EID: 34547872327     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L405     Document Type: Article

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