Self-assembled monolayers of poly(ethylene glycol) siloxane as a resist for ultrahigh-resolution electron beam lithography on silicon oxide

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 5, 2009, Pages 2292-2300

  Gao, Bo ^a   Bernstein, Gary H ^b   Lieberman, Marya ^a  

^a UNIVERSITY OF NOTRE DAME   (United States)

^b University of Notre Dame   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING SELECTIVITY; COWPEA MOSAIC VIRUS; ETHYLENEOXY; EXPOSURE CONDITIONS; NM RESOLUTION; NON-SPECIFIC BINDING; PATTERNED FILMS; SILICON OXIDE SURFACES; TRIMETHOXYSILANE;

AMINO ACIDS; BIOMOLECULES; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ETHYLENE; ETHYLENE GLYCOL; POLYETHYLENE GLYCOLS; POLYETHYLENE OXIDES; SILICON COMPOUNDS; SILICON OXIDES;

SELF ASSEMBLED MONOLAYERS;

EID: 70349685079     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3212899     Document Type: Article

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