Ionized Physical Vapour Deposition combined with PECVD, for synthesis of carbon-metal nanocomposite thin films

Solid State Sciences

Volumn 11, Issue 10, 2009, Pages 1824-1827

  Tessier, P Y ^a   Issaoui, R ^a   Luais, E ^a   Boujtita, M ^a   Granier, A ^a   Angleraud, B ^a  

^a UNIVERSITÉ DE NANTES   (France)

Author keywords

Carbon; PECVD; PVD; Sputtering; Thin films; Titanium

Indexed keywords

CARBON-METAL COMPOSITES; DC OPERATION; DEPOSITION CONDITIONS; DEPOSITION PROCESS; DISCHARGE INSTABILITIES; FILM MICROSTRUCTURES; GAS DISCHARGE; H MATRIX; HYBRID PROCESS; METAL NANOCOMPOSITES; METHANE PLASMA; OPERATING MODES; PECVD; PHYSICAL VAPOUR DEPOSITION; PVD; RF MAGNETRONS; XPS; XRD;

ARGON; CARBON FILMS; COMPOSITE FILMS; DEPOSITION; GLOW DISCHARGES; IONIZATION OF GASES; MAGNETRONS; METHANE; MICROSTRUCTURE; SYNTHESIS (CHEMICAL); THIN FILMS; TITANIUM; TITANIUM CARBIDE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 70349329192     PISSN: 12932558     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solidstatesciences.2009.05.008     Document Type: Article

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