Synthesis of DLC films by PECVD combined with hollow cathode sputtering

Vacuum

Volumn 80, Issue 7 SPEC. ISS., 2006, Pages 736-739

  Anita, V ^a,b   Butsuda, T ^b   Saito, N ^b   Takai, O ^b  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Diamond like carbon; Electrical properties; Hollow magnetron sputtering; Hybrid process; Plasma enhanced chemical vapour deposition

Indexed keywords

CATHODES; MAGNETRON SPUTTERING; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR DOPING; THIN FILMS;

HOLLOW CATHODE SPUTTERING; HOLLOW MAGNETRON DISCHARGE SPUTTERING; METHANE MASS FLOW;

DIAMOND LIKE CARBON FILMS;

EID: 33747410832     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.11.020     Document Type: Article

References (2)

1. Robertson J. Mater Sci Eng R37 (2002) 129-281
2. Chapmann B. Glow discharge processes, sputtering and plasma etching (1980), Wiley, New York p. 262