Near-field optical photolithography for high-aspect-ratio patterning using bilayer resist

Applied Physics Letters

Volumn 86, Issue 20, 2005, Pages 1-3

  Naya, M ^a   Tsuruma, I ^a   Tani, T ^a   Mukai, A ^a   Sakaguchi, S ^a   Yasunami, S ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DRY ETCHING; ELECTRIC FIELD EFFECTS; PHOTOSENSITIVITY; PLASMAS; SCANNING ELECTRON MICROSCOPY;

BILAYER RESIST PROCESS; CELL PROJECTION METHODS; HIGH-ASPECT-RATIO PATTERNING; NEAR-FIELD OPTICAL PHOTOLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 20844450745     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1931056     Document Type: Article

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