Experimental comparison of resolution and pattern fidelity in single- and double-layer planar lens lithography

Journal of the Optical Society of America B: Optical Physics

Volumn 23, Issue 3, 2006, Pages 461-467

  Melville, David O S ^a   Blaikie, Richard J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FINITE DIFFERENCE METHOD; LITHOGRAPHY; SURFACE ROUGHNESS; TIME DOMAIN ANALYSIS;

DOUBLE-LAYER PLANAR LENS LITHOGRAPHY; PATTERN FIDELITY; SINGLE-LAYER PLANAR LENS LITHOGRAPHY; SUB-DIFFRACTION-LIMITED FEATURES;

OPTICAL INSTRUMENT LENSES;

EID: 33645742792     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.23.000461     Document Type: Article

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