Rapid thermal oxidation of porous silicon for surface passivation

Materials Science in Semiconductor Processing

Volumn 1, Issue 3-4, 1998, Pages 281-285

  Debarge, L ^a   Stoquert, J P ^a   Slaoui, A ^a   Stalmans, L ^b   Poortmans, J ^b  

^a UMR 7005   (France)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343127108     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00039-0     Document Type: Article

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