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Volumn 44, Issue 9, 2009, Pages 2312-2321

0.13 μ m SiGe BiCMOS technology fully dedicated to mm-wave applications

Author keywords

BiCMOS integrated circuits technology; Heterojunction bipolar transistor (HBT); Integrated circuit fabrication; Millimeter wave technology; Silicon Germanium (SiGe)

Indexed keywords

BICMOS INTEGRATED CIRCUITS TECHNOLOGY; HETEROJUNCTION BIPOLAR TRANSISTOR (HBT); INTEGRATED CIRCUIT FABRICATION; MILLIMETER WAVE TECHNOLOGY; SILICON GERMANIUM (SIGE);

EID: 70249143924     PISSN: 00189200     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSSC.2009.2024102     Document Type: Article
Times cited : (133)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.