Deposition of low dielectric constant SiOC films by using an atmospheric pressure microplasma jet

Journal of Physics D: Applied Physics

Volumn 42, Issue 12, 2009, Pages

  Ding, Yi ^a,b   He, Deyan ^a   Shirai, Hajime ^b  

^a LANZHOU UNIVERSITY   (China)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; DIELECTRIC CONSTANTS; FILM DEPOSITION RATES; FUTURE GENERATIONS; INTERCONNECT DIELECTRICS; LOW DIELECTRIC CONSTANTS; LOW PRESSURE PLASMA; LOW PRESSURES; MAXIMUM VALUES; MICRO-PLASMA JET; PRODUCTION PROCESS; SIOC FILM; TETRAETHOXYSILANES;

ARGON; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CERAMIC CAPACITORS; DIELECTRIC WAVEGUIDES; ELECTRIC FIELDS; INTEGRATED CIRCUITS; JETS; PERMITTIVITY; PLASMA DEPOSITION; PLASMA DEVICES; PLASMA DISPLAY DEVICES;

DIELECTRIC MATERIALS;

EID: 70149122315     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/12/125503     Document Type: Article

References (18)

1. Singer P 1998 Semicond. Int. 21 90
2. Jung A S, Navamathavan R, Lee K M and Choi C K 2008 Surf. Coat. Technol. 202 5693
3. Kim C Y, Navamathavan R, Lee H J and Choi C K 2008 Surf. Coat. Technol. 202 5688
4. Lee W W and Ho P S 1997 MRS Bull. 10 19
5. Maex K, Baklanov M R, Shamiryan D, Iacopi F, Brongersma S H and Yanovitskaya Z S 2003 J. Appl. Phys. 93 8793
6. Yuan C A, van der S O, Zhang G Q, Ernst L J, Van D W D, Flower A E and Van S R B R 2008 Appl. Phys. Lett. 92 061909
7. Grill A and Patel V 1999 J. Appl. Phys. 85 3314
8. Benedikt J, Focke K, Yanguas-Gil A and von K A 2006 Appl. Phys. Lett. 89 251504
9. Tan H M L, Fukuda H, Akagi T and Ichiki T 2007 Thin Solid Films 515 5172
10. Ichiki T, Taura R and Horiike Y 2004 J. Appl. Phys. 95 35
11. Raballand V, Benedikt J and Keudell A von 2008 Appl. Phys. Lett. 92 091502
12. Aumaille K, Granier A, Schmidt M, Grolleau B, Vallee C and Turban G 2000 Plasma Sources Sci. Technol. 9 331
13. Cui H, Carter R J, Moore D L, Peng H, Gidley D W and Burke P A 2005 J. Appl. Phys. 97 113302
14. Grill A and Neumayer D A 2003 J. Appl. Phys. 94 6697
15. Grill A, Sternhagen V, Neumayer D and Patel V 2005 J. Appl. Phys. 98 074502
16. Si J J, Ono H, Uchida K, Nozaki S, Morisaki H and Itoh N 2001 Appl. Phys. Lett. 79 3140
17. Grill A and Patel V 2001 Appl. Phys. Lett. 79 803
18. Durrant S F, Rouxinol F P M, Gelamo R V, Trasferetti B C, Davanzo C U and Moraes M A B de 2008 Thin Solid Films 516 803