Highly conductive, undoped ZnO thin films deposited by electron-cyclotron-resonance plasma sputtering on silica glass substrate

Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 22-26

  Akazawa, Housei ^a  

^a NTT CORPORATION   (Japan)

Author keywords

Sputtering; Transparent conductive oxide; Zinc oxide

Indexed keywords

ARGON PRESSURE; CRYSTALLINE DOMAINS; ECR PLASMA; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRON CYCLOTRON RESONANCE PLASMA; ELECTRON CYCLOTRONS; EXCITATION EFFICIENCY; GAS PRESSURES; INTERSTITIALS; OPTICAL TRANSMITTANCE; PLASMA SPUTTERING; ROCKING CURVES; ROOM TEMPERATURE; SILICA GLASS SUBSTRATE; TRANSPARENT CONDUCTIVE OXIDE; VISIBLE WAVELENGTHS; X- RAY DIFFRACTION; ZN ATOMS; ZNO FILMS; ZNO THIN FILM;

ARGON; CARRIER CONCENTRATION; CONDUCTIVE FILMS; CYCLOTRONS; ELECTRIC PROPERTIES; ELECTRON CYCLOTRON RESONANCE; GALVANOMAGNETIC EFFECTS; HALL MOBILITY; LIGHT TRANSMISSION; MAGNETIC FIELDS; METALLIC FILMS; OPACITY; OXYGEN; OXYGEN VACANCIES; PLASMA DEPOSITION; PLASMAS; RESONANCE; SEMICONDUCTING ZINC COMPOUNDS; SILICA; ZINC; ZINC OXIDE;

INTEGRATED OPTOELECTRONICS;

EID: 69549107750     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.06.008     Document Type: Article

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