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Volumn 10, Issue 1, 2010, Pages 47-51

Fabrication and annealing effects of SnO2/SiOx nanocables sheathed by the sputtering technique

Author keywords

Nanostructures; Transmission electron microscopy

Indexed keywords

ANNEALING EFFECTS; CORE-SHELL NANOWIRES; ELEMENTAL MAPPING; GAUSSIAN FITTING; NANO-SIZED; NANOCABLES; OUTER SURFACE; PL EMISSION; PL MEASUREMENTS; RELATIVE INTENSITY; ROOM TEMPERATURE; RUTILE STRUCTURE; SHELL LAYERS; SPUTTERING METHODS; SPUTTERING TECHNIQUES; THERMAL-ANNEALING; YELLOW BANDS;

EID: 69249214193     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2009.04.009     Document Type: Article
Times cited : (1)

References (37)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.