Al2O3 coating of ZnO nanorods by atomic layer deposition

Journal of Crystal Growth

Volumn 252, Issue 4, 2003, Pages 565-569

  Min, B ^a   Lee, J S ^a   Hwang, J W ^a   Keem, K H ^a   Kang, M I ^a   Cho, K ^a   Sung, M Y ^a   Kim, S ^a   Lee, M S ^b   Park, S O ^b   Moon, J T ^b  

^a Korea University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

A1. Coating; A1. Transmission electron microscopy; A2. Atomic layer deposition; B1. Al2O3; B1. ZnO nanorods

Indexed keywords

ALUMINUM COMPOUNDS; COATINGS; TRANSMISSION ELECTRON MICROSCOPY; ZINC OXIDE;

ATOMIC LAYER DEPOSITION;

NANOSTRUCTURED MATERIALS;

EID: 0037402207     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(03)00967-9     Document Type: Article

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