Coaxial ZnO/SiO2 nanocables fabricated by thermal evaporation/oxidation

Applied Physics A: Materials Science and Processing

Volumn 78, Issue 4, 2004, Pages 557-559

  Dai, L ^a   Chen, X L ^a   Zhang, X ^a   Zhou, T ^a   Hu, B ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBES; DISSOLUTION; ELECTRON DIFFRACTION; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; FIELD EFFECT TRANSISTORS; HIGH RESOLUTION ELECTRON MICROSCOPY; HYDROCHLORIC ACID; IRRADIATION; LASER ABLATION; OXIDATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR INSULATOR BOUNDARIES; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; ZINC OXIDE;

CARBON NANOTUBES (CNT); SELECTIVE AREA ELECTRON DIFFRACTION (SAED);

COAXIAL CABLES;

EID: 1242329902     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-003-2427-7     Document Type: Article

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