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Volumn 24, Issue 4, 2009, Pages

Investigation of electrostatic integrity for ultra-thin-body GeOI MOSFET using analytical solution of Poisson's equation

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL SOLUTIONS; BACK-GATE BIAS; BURIED OXIDE THICKNESS; CHANNEL LENGTH; CHANNEL THICKNESS; ELECTROSTATIC INTEGRITY; MOS-FET; MOSFETS; POISSON'S EQUATION; SUBTHRESHOLD SWING; TCAD SIMULATION; ULTRA-THIN-BODY;

EID: 68949108146     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/24/4/045017     Document Type: Article
Times cited : (25)

References (18)
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    • Selectively formed high mobility strained Ge pMOSFETs for high-performance CMOS
    • Shang H et al 2004 Selectively formed high mobility strained Ge pMOSFETs for high-performance CMOS IEDM Tech. Dig. p 157
    • (2004) IEDM Tech. Dig. , pp. 157
    • Shang, H.1
  • 8
    • 50249099761 scopus 로고    scopus 로고
    • Localized SOI technology: An innovative low cost self aligned process for ultra thin Si-film on thin BOX integration for low power applications
    • Monfray S et al 2007 Localized SOI technology: an innovative low cost self aligned process for ultra thin Si-film on thin BOX integration for low power applications IEDM Tech. Dig. p 693
    • (2007) IEDM Tech. Dig. , pp. 693
    • Monfray, S.1
  • 9
    • 34547781729 scopus 로고    scopus 로고
    • Impact of parameter variations and random dopant fluctuations on short channel fully depleted SOI MOSFETs with extremely thin BOX
    • Tetsu O, Nobuyuki S and Toshiro H 2007 Impact of parameter variations and random dopant fluctuations on short channel fully depleted SOI MOSFETs with extremely thin BOX IEEE Trans. Electron Devices 28 740
    • (2007) IEEE Trans. Electron Devices , vol.28 , pp. 740
    • Tetsu, O.1    Nobuyuki, S.2    Toshiro, H.3
  • 11
    • 25444529430 scopus 로고    scopus 로고
    • Comparison of device performance and scaling capability of thin body GOI and SOI MOSFETs
    • An X, Huang R, Zhang X and Wang Y 2005 Comparison of device performance and scaling capability of thin body GOI and SOI MOSFETs Semicond. Sci. Technol. 20 1034
    • (2005) Semicond. Sci. Technol. , vol.20 , pp. 1034
    • An, X.1    Huang, R.2    Zhang, X.3    Wang, Y.4
  • 13
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    • International Technology Roadmap for Semiconductors http://www.itrs.net/
  • 14
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    • ISE TCAD Rel. 10.0 Manual (DESSIS) 2004 - ref-separator
    • ISE TCAD Rel. 10.0 Manual (DESSIS) 2004 - ref-separator -
  • 15
    • 0030150795 scopus 로고    scopus 로고
    • A 3D analytical model for threshold voltage of small-geometry MOSFET
    • Noor A and Shekhar C 1996 A 3D analytical model for threshold voltage of small-geometry MOSFET Solid-State Electron. 39 745
    • (1996) Solid-State Electron. , vol.39 , pp. 745
    • Noor, A.1    Shekhar, C.2
  • 16
    • 4344708136 scopus 로고    scopus 로고
    • Threshold voltage model for mesa-isolated small geometry fully depleted SOI MSOFETs based on analytical solution of 3-D Poisson's equation
    • Katti G, DasGupta N and DasGupta A 2004 Threshold voltage model for mesa-isolated small geometry fully depleted SOI MSOFETs based on analytical solution of 3-D Poisson's equation IEEE Trans. Electron Devices 51 1169
    • (2004) IEEE Trans. Electron Devices , vol.51 , pp. 1169
    • Katti, G.1    Dasgupta, N.2    Dasgupta, A.3
  • 18
    • 0034315445 scopus 로고    scopus 로고
    • Silicon-on-nothing (SON)-an innovative process for advanced CMOS
    • Jurczak M et al 2000 Silicon-on-nothing (SON)-an innovative process for advanced CMOS IEEE Trans. Electron Devices 47 2179
    • (2000) IEEE Trans. Electron Devices , vol.47 , pp. 2179
    • Jurczak, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.