Implantation of anatase thin film with 100 keV 56Fe ions: Damage formation and magnetic behaviour

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 16, 2009, Pages 2725-2730

  Jensen, J ^a   Sanz, R ^c   Martin, D ^a   Surpi, A ^a,b   Kubart, T ^a   Vazquez M ^c   Hernandez Velez, M ^d  

^a UPPSALA UNIVERSITY   (Sweden)

^b Mälardalens Högskola ^*  (Sweden)

^c INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^d UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

Anatase; Fe doping; Ion implantation; Magnetic semiconductors; Magnetron sputtering; Titanium dioxide

Indexed keywords

ANATASE; ANATASE FILMS; ANATASE STRUCTURES; DAMAGE FORMATION; DAMAGE MORPHOLOGY; FE CLUSTERS; FE-DOPING; FE-IONS; FERROMAGNETIC BEHAVIOUR; FLUENCES; IMPLANTED SAMPLES; INDUCED DAMAGE; MAGNETIC BEHAVIOUR; MAGNETIC RESPONSE; POLYCRYSTALLINE; ROOM TEMPERATURE; SECONDARY PHASIS; TITANIUM DIOXIDE FILMS; TITANIUM DIOXIDE THIN FILM;

ION BEAMS; ION IMPLANTATION; IRON COMPOUNDS; MAGNETIC PROPERTIES; MAGNETIC SEMICONDUCTORS; MAGNETISM; MAGNETRONS; MORPHOLOGY; SEMICONDUCTOR DOPING; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

ION BOMBARDMENT;

EID: 68549140078     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.05.055     Document Type: Article

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