Influence of the target composition on reactively sputtered titanium oxide films

Vacuum

Volumn 83, Issue 10, 2009, Pages 1295-1298

  Kubart, T ^a,b   Jensen, J ^a   Nyberg, T ^a   Liljeholm, L ^a   Depla, D ^c   Berg, S ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

^c GHENT UNIVERSITY   (Belgium)

Author keywords

High rate deposition; Magnetron sputtering; Sputtering; TiO2; Titanium dioxide

Indexed keywords

ANTI REFLECTIVE COATINGS; DEPOSITED FILMS; DEPOSITION TECHNIQUE; ELASTIC RECOIL DETECTION ANALYSIS; ELEMENTAL COMPOSITIONS; EXTERNAL HEATING; GLASS COATING; GROWING FILMS; HIGH DEPOSITION RATES; HIGH RATE; HIGH RATE DEPOSITION; HIGH REFRACTIVE INDEX; HYSTERESIS BEHAVIOUR; LARGE-AREA COATING; OXYGEN CONTENT; OXYGEN FLOW; PROPERTIES OF COATINGS; REACTIVE MAGNETRON SPUTTERING; SILICON SUBSTRATES; TARGET COMPOSITION; TIO; TIO2; TITANIA; TITANIUM DIOXIDE THIN FILM; X-RAY AMORPHOUS;

AMORPHOUS FILMS; CHEMICAL ANALYSIS; COATINGS; FILM GROWTH; GLASS; GLASS INDUSTRY; MAGNETRON SPUTTERING; MAGNETRONS; OXYGEN; REFRACTIVE INDEX; TARGETS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE FILMS;

EID: 67349247811     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.03.026     Document Type: Article

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