Application of plasma deposited organosilicon thin films for the corrosion protection of metals

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 107-111

  Fracassi, F ^a   d'Agostino, R ^a   Palumbo, F ^a   Angelini, E ^b   Grassini, S ^b   Rosalbino, F ^b  

^a UNIVERSITY OF BARI   (Italy)

^b POLITECNICO DI TORINO   (Italy)

Author keywords

Corrosion; PECVD; SiOx

Indexed keywords

DEPOSITION; ELECTROLYTES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROTECTIVE COATINGS; SPECTROSCOPIC ANALYSIS;

ORGANOSILICON;

CORROSION PROTECTION;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18344408460     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00422-5     Document Type: Article

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