Micropatterning of poly(dimethylsiloxane) using a photoresist lift-off technique for selective electrical insulation of microelectrode arrays

Journal of Micromechanics and Microengineering

Volumn 19, Issue 6, 2009, Pages

  Park, Jaewon ^a   Kim, Hyun Soo ^a   Han, Arum ^a  

^a Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIOSENSING; DILUTION RATIO; ELECTRICAL INSULATION; ELECTRICAL INSULATION LAYERS; ELECTRICAL RESISTANCES; FABRICATION METHOD; FLEXIBLE SUBSTRATE; INSULATION LAYERS; LIFT-OFF PROCESS; LIFTOFF TECHNIQUE; LIQUID PHASE; MICRO DEVICES; MICRO PATTERNING; MICROELECTRODE ARRAY; MULTIELECTRODE ARRAYS; NEURONAL NETWORKS; PATTERNING METHODS; PHOTORESIST PATTERNS; POLYDIMETHYLSILOXANE PDMS; PROCESSING PARAMETERS; SMALL FEATURES; SPIN-COATINGS;

BIOCOMPATIBILITY; MICROCHANNELS; PHOTORESISTORS; PHOTORESISTS; SPIN DYNAMICS; SUBSTRATES; SURFACE TREATMENT;

SILICONES;

EID: 68249147986     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/6/065016     Document Type: Article

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