Photosensitive poly(dimethylsiloxane) materials for microfluidic applications

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1104-1108

  Tsougeni, Katerina ^a   Tserepi, Angeliki ^a   Gogolides, Evangelos ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Deep UV lithography; Microfluidics; Photoinitiators; Poly(dimethylsiloxane); UV curing

Indexed keywords

DEEP UV LITHOGRAPHY; PHOTOINITIATORS; PHOTOPATTERNING PROCESS; UV CURING;

CROSSLINKING; CURING; LITHOGRAPHY; MEMS; MICROFLUIDICS; PHOTOSENSITIVITY; PLASMA ETCHING; ULTRAVIOLET RADIATION;

POLYDIMETHYLSILOXANE;

EID: 34247881939     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.011     Document Type: Article

References (13)

1. Shaw J., Hatzakis M., Paraszczak J., and Babich E. Microelectron. Eng. 3 (1985) 293-304
2. Shaw J., Hatzakis M., Paraszczak J., Liutkus J., and Babich E. Polym. Eng. Sci. 23 (1983) 18
3. Paraszczak J., Babich E., McGouey R., Heidenreich J., Hatzakis M., and Shaw J. Microelectron. Eng. 6 (1987) 453-460
4. Babich E., Shaw J., Hatzakis M., Paraszczak J., Lenz R.W., and Dvornich P.R. Microelectron. Eng. 6 (1987) 511-518
5. Shaw J., Babich E., Hatzakis M., and Paraszczak J. Solid State Technol. (1987)
6. Tserepi A., Cordoyiannis G., Patsis G.P., Constantoudis V., Gogolides E., Valamontes E.S., Eon D., Peignon M.-C., Cartry G., Cardinaud C., and Turban G. J. Vac. Sci. Technol. B 21 1 (2003) 174
7. Tserepi A., Valamontes E.S., Tegou E., Raptis I., and Gogolides E. Microelectron. Eng. 57-58 (2001) 547-554
8. Product information for WL-5351 and WL-5150, Dow Corning .
9. Product information for Cyclotene, Dow Chemical .
10. Kim W.-S., Houbertz R., Lee T.-H., and Bae B.-S. J. Polym. Sci. 42 (2004) 1979-1986
11. Product information for VDT 954, ABCR, Germany .
12. Product information for PS 264, United Chemical Technologies .
13. N. Vourdas, A. Tsougeni, A. Tserepi, A.G. Boudouvis, E. Gogolides, S. Tragoulias, T.K. Christopoulos, in: J. Mostaghimi, et al. (Eds.), Seventeenth International Symposium on Plasma Chemistry (ISPC) (full paper in CD), Toronto, Canada, August 7-11, 2005.