SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 293, Issue 1-2, 1997, Pages 327-332

Copper enrichment in Al-Cu alloys due to electropolishing and anodic oxidation

(6) Zhou, X a Thompson, G E a Habazaki, H b Shimizu, K c Skeldon, P a Wood, G C a

a UNIVERSITY OF MANCHESTER (United Kingdom)

b TOHOKU UNIVERSITY (Japan)

c KEIO UNIVERSITY (Japan)

Author keywords

Aluminium; Anodic oxidation; Condensed matter film behaviour; Rutherford backscattering spectroscopy; Transmission electron microscopy

Indexed keywords

ANODIC OXIDATION; COMPOSITION EFFECTS; COPPER; CURRENT DENSITY; ELECTROLYTIC POLISHING; INTERFACES (MATERIALS); RUTHERFORD BACKSCATTERING SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

CONDENSED MATTER FILM BEHAVIOR;

ALUMINUM ALLOYS;

EID: 0030702199 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(96)09117-1 Document Type: Article

Times cited : (131)

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