Glass substrate cleaning using a low energy ion source

Surface and Coatings Technology

Volumn 142, Issue 144, 2001, Pages 767-770

  Ochs, D ^a   Schroeder, J ^a   Cord, B ^a   Scherer, J ^a  

^a Unaxis Deutschland GmbH   (Germany)

Author keywords

Atomic force microscopy; Carbon film; Etching; Glass; Hard disk; Ion source

Indexed keywords

ATOMIC FORCE MICROSCOPY; CLEANING; CONTAMINATION; GLASS; ION SOURCES; SUBSTRATES; TOPOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

STANDARD HEATING PROCESS;

COATING TECHNIQUES;

ETCHING;

EID: 0035386399     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01210-5     Document Type: Article

References (7)