메뉴 건너뛰기




Volumn 95, Issue 3, 2009, Pages

Reduction of dislocation density in epitaxial GaN layers by overgrowth of defect-related etch pits

Author keywords

[No Author keywords available]

Indexed keywords

DISLOCATION DENSITIES; DISLOCATIONS DENSITIES; ETCH PITS; GAN LAYERS; GAN TEMPLATE; GROWTH PROCESS; HYDRIDE VAPOR PHASE EPITAXY; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOLTEN SALT; OPTIMIZED CONDITIONS; PHOTO-ETCHING;

EID: 67651247341     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3171928     Document Type: Article
Times cited : (48)

References (15)
  • 1
    • 84958889335 scopus 로고    scopus 로고
    • 1st ed., edited by P. Ruterana, M. Albrecht, and J. Neugebauer (Wiley VCH, Weinheim, Germany).
    • Nitride Semiconductors: Handbook on Materials and Devices, 1st ed., edited by, P. Ruterana, M. Albrecht, and, J. Neugebauer, (Wiley VCH, Weinheim, Germany, 2003).
    • (2003) Nitride Semiconductors: Handbook on Materials and Devices
  • 8
    • 0032643182 scopus 로고    scopus 로고
    • 0022-0248,. 10.1016/S0022-0248(98)01344-X
    • S. Nakamura, J. Cryst. Growth 0022-0248 201, 290 (1999). 10.1016/S0022-0248(98)01344-X
    • (1999) J. Cryst. Growth , vol.201 , pp. 290
    • Nakamura, S.1
  • 9
    • 0035855024 scopus 로고    scopus 로고
    • 0953-8984,. 10.1088/0953-8984/13/32/306
    • K. Hiramatsu, J. Phys.: Condens. Matter 0953-8984 13, 6961 (2001). 10.1088/0953-8984/13/32/306
    • (2001) J. Phys.: Condens. Matter , vol.13 , pp. 6961
    • Hiramatsu, K.1
  • 12
    • 33845315243 scopus 로고    scopus 로고
    • Characterization of wide-band-gap semiconductors (GaN, SiC) by defect-selective etching and complementary methods
    • DOI 10.1016/j.spmi.2006.06.011, PII S0749603606000607
    • J. L. Weyher, Superlattices Microstruct. 0749-6036 40, 279 (2006). 10.1016/j.spmi.2006.06.011 (Pubitemid 44873062)
    • (2006) Superlattices and Microstructures , vol.40 , Issue.4-6 SPEC. ISS. , pp. 279-288
    • Weyher, J.L.1
  • 15


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.