Hierarchical and nanosized pattern formation using dual beam focused ion beam microscope

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 4, 2009, Pages 2598-2602

  Lu, Kathy ^a  

^a State University   (United States)

Author keywords

Focused ion beam; Hierarchical size; Nanopattern; Nanopore; Nanotrack; Pattern modification

Indexed keywords

DIFFERENT SIZES; DUAL BEAM; DUAL-BEAM MICROSCOPES; ELECTRON BEAM IMAGING; FEATURE SHAPE; FOCUSED ION BEAM TECHNIQUE; HIERARCHICAL SIZE; HIGH PURITY ALUMINUM; HIGH RESOLUTION; ION BEAM MICROSCOPE; ION BEAM PATTERNING; LOW DOSE; NANO-SIZED PATTERNS; NANOFABRICATION; NANOFABRICATION PROCESS; NANOPATTERN; NANOPATTERNING; NANOTRACK; PATTERN MODIFICATION; TRACK WIDTH;

ALUMINA; BEAM PLASMA INTERACTIONS; ELECTRON BEAMS; FOCUSED ION BEAMS; HIGH RESOLUTION ELECTRON MICROSCOPY; ION BOMBARDMENT; NANOPORES;

IONS;

EID: 67650793535     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.dk17     Document Type: Article

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