Transparent conducting V-co-doped AZO thin films prepared by magnetron sputtering

Thin Solid Films

Volumn 434, Issue 1-2, 2003, Pages 14-19

  Suzuki, Shingo ^a   Miyata, Toshihiro ^a   Ishii, Makoto ^a   Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

AZO; Co Doping; Etching rate; Magnetron sputtering; Thin films; Transparent conducting oxide; ZnO

Indexed keywords

DOPING (ADDITIVES); ETCHING; MAGNETRON SPUTTERING; SPUTTER DEPOSITION;

TRANSPARENT CONDUCTING FILMS;

THIN FILMS;

EID: 0038277016     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00463-2     Document Type: Article

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