Crystalline ultrasmooth self-assembled monolayers of alkylsilanes for organic field-effect transistors

Journal of the American Chemical Society

Volumn 131, Issue 26, 2009, Pages 9396-9404

  Ito, Yutaka ^a,d   Virkar, Ajay A ^a   Mannsfeld, Stefan ^b   Joon, Hak Oh ^a   Toney, Michael ^b   Locklin, Jason ^c   Bao, Zhenan ^a  

^a Stanford University   (United States)

^b SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^c University of Georgia   (United States)

^d TOPPAN PRINTING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYLSILANES; ATTENUATED TOTAL REFLECTANCE FOURIER TRANSFORM INFRARED; CASTING TECHNIQUES; CRYSTALLINE PHASE; FTIR; GRAZING ANGLES; GRAZING INCIDENCE X-RAY DIFFRACTION; LAYERED GROWTH; OCTADECYL; OCTADECYLTRICHLOROSILANE; ORGANIC FIELD-EFFECT TRANSISTORS; ORGANOSILANE COMPOUNDS; PENTACENE; SAMS; TRIMETHOXYSILANE;

ACOUSTIC MICROSCOPES; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CONTACT ANGLE; CRYSTALLINE MATERIALS; ELECTRON MOBILITY; FIELD EFFECT TRANSISTORS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SEMICONDUCTOR GROWTH; SILANES;

SELF ASSEMBLED MONOLAYERS;

SELF ASSEMBLED MONOLAYER; SILANE DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; ELECTRON; ELLIPSOMETRY; FIELD EFFECT TRANSISTOR; INFRARED SPECTROSCOPY; SEMICONDUCTOR; X RAY DIFFRACTION;

EID: 67649995543     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja9029957     Document Type: Article

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