Conducting AFM and 2D GIXD studies on pentacene thin films

Journal of the American Chemical Society

Volumn 127, Issue 33, 2005, Pages 11542-11543

  Yang, Hoichang ^a,d   Shin, Tae Joo ^b   Ling, Mang Mang ^c   Cho, Kilwon ^d   Ryu, Chang Y ^a   Bao, Zhenan ^c  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c Stanford University   (United States)

^d Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDE; HEXADECANE; SILANE DERIVATIVE; SILICON DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; FILM; SEMICONDUCTOR; SURFACE PROPERTY; X RAY DIFFRACTION;

CRYSTALLIZATION; MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; ORGANOSILICON COMPOUNDS; SILICON DIOXIDE; X-RAY DIFFRACTION;

EID: 23944443280     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja052478e     Document Type: Article

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