Fabrication of ZnO thin film-nanowires hybrid homojunction on silicon substrate

Solid State Communications

Volumn 149, Issue 33-34, 2009, Pages 1337-1341

  Kar, J P ^a   Kumar, M ^a   Choi, J H ^a   Das, S N ^a   Choi, S Y ^a   Myoung, J M ^a  

^a Yonsei University   (South Korea)

Author keywords

A. Semiconductors; B. Nanofabrications; C. Hybrid structures; D. Electrical properties

Indexed keywords

A. SEMICONDUCTORS; B. NANOFABRICATIONS; C. HYBRID STRUCTURES; CURRENT-VOLTAGE MEASUREMENTS; D. ELECTRICAL PROPERTIES; E BEAM EVAPORATION; HOMOJUNCTION; HYBRID STRUCTURE; METALORGANIC CHEMICAL VAPOR DEPOSITION; P TYPE ZNO THIN FILM; P-TYPE ZNO FILM; RF MAGNETRON SPUTTERING TECHNIQUE; SILICON SUBSTRATES; ZNO; ZNO NANOWIRES; ZNO THIN FILM;

ELECTRIC PROPERTIES; ELECTRIC WIRE; MAGNETRON SPUTTERING; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NANOWIRES; OPTICAL FILMS; ORGANIC CHEMICALS; ORGANOMETALLICS; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR QUANTUM DOTS; SUBSTRATES; THIN FILM DEVICES; THIN FILMS; VAPORS; ZINC OXIDE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 67649969144     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2009.05.024     Document Type: Article

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