Comparative study on the growth characteristics of ZnO nanowires and thin films by metalorganic chemical vapor deposition (MOCVD)

Journal of Crystal Growth

Volumn 268, Issue 1-2, 2004, Pages 149-154

  Jeong, Min Chang ^a   Oh, Byeong Yun ^a   Lee, Woong ^a   Myoung, Jae Min ^a  

^a Yonsei University   (South Korea)

Author keywords

A3. Metalorganic chemical vapor deposition; A3. Thin film; B1. Nanowires; B1. ZnO

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRON MICROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUCLEATION; PHOTOLUMINESCENCE; RESIDUAL STRESSES; SPECTROSCOPIC ANALYSIS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

COMPRESSIVE MISMATCH; DOWNSIZING; GROWTH CHARACTERISTICS; NANOWIRES;

NANOSTRUCTURED MATERIALS;

EID: 2942726529     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.05.019     Document Type: Article

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