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Physical Review B - Condensed Matter and Materials Physics

Volumn 79, Issue 19, 2009, Pages

X-ray photoelectron diffraction study of thin Al2 O3 films grown on Si(111) by molecular beam epitaxy

(7) El Kazzi, M a Grenet, G a Merckling, C a,b Saint Girons, G a Botella, C a Marty, O a Hollinger, G a

a UNIVERSITÉ DE LYON (France)

b STMICROELECTRONICS (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 67449107246 PISSN: 10980121 EISSN: 1550235X Source Type: Journal
DOI: 10.1103/PhysRevB.79.195312 Document Type: Article

Times cited : (4)

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