Substrate effects on the microstructure of hydrogenated amorphous carbon films

Current Applied Physics

Volumn 9, Issue 5, 2009, Pages 937-942

  Ahmad, I ^a   Roy, S S ^a   Rahman, Md A ^a   Okpalugo, T I T ^a   Maguire, P D ^a   McLaughlin, J A ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

Chemical vapour deposition; Diamond like carbon; Electrical properties; Raman spectroscopy

Indexed keywords

A-C:H FILMS; CHEMICAL BONDINGS; CHEMICAL VAPOUR DEPOSITION; DIAMOND-LIKE CARBON; DIELECTRIC BREAKDOWN STRENGTHS; DIFFERENT SUBSTRATES; ELECTRICAL PROPERTIES; ELECTRICAL RESISTIVITIES; GROWTH CONDITIONS; HYDROGENATED AMORPHOUS CARBON FILMS; LOW ADHESIONS; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE SPECTROSCOPIES; PEAK POSITIONS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITIONS; POLYMERIC SUBSTRATES; SILICON LAYERS; SILICON SUBSTRATES; STAINLESS STEEL SUBSTRATES; SUBSTRATE EFFECTS;

ABSORPTION SPECTROSCOPY; AMORPHOUS CARBON; AMORPHOUS FILMS; CARBIDES; CHEMICAL BONDS; DIAMONDS; ELECTRIC BREAKDOWN; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; HYDROGENATION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SPECTRUM ANALYSIS; STAINLESS STEEL; SUBSTRATES;

CARBON FILMS;

EID: 67349208495     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2008.09.006     Document Type: Article

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