The effect of silicon doping and thermal annealing on the electrical and structural properties of hydrogenated amorphous carbon thin films

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 1549-1552

  Okpalugo, T I T ^a   Maguire, P D ^a   Ogwu, A A ^a   McLaughlin, J A D ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

DLC; Electrical characteristics; Silicon doping; Work function

Indexed keywords

ANNEALING; BIOSENSORS; DOPING (ADDITIVES); GRAPHITIZATION; HYDROGENATION; IMPLANTS (SURGICAL); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; THERMODYNAMIC STABILITY;

CONTACT POTENTIAL DIFFERENCE (CPD); SILICON DOPING; THERMAL ANNEALING; TRAP DENSITIES;

DIAMOND LIKE CARBON FILMS;

DIAMOND;

EID: 2442438738     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.11.032     Document Type: Article

References (11)

1. Maguire P.D. Magill D. Ogwu A.A. McLaughlin J. Diamond Relat. Mater. 10 2001 216-223
2. Magill D.P. Ogwu A.A. McLaughlin J. Maguire P.D. McCullough R.W. Voulot D.et al. J. Vac. Sci. Technol. A 19 2001 2456
3. Gangopadhyay A.K. Willermet P.A. Tamor M.A. Vassell W.C. Tribol. Int. 30 1997 9-18 19-31
4. Ogwu A.A. Lamberton R.W. Morley S. Maguire P. McLaughlin J. Physica B 269 1999 335-344
5. T.I.T. Okpalugo, A.A. Ogwu, P.D. Maguire, J. McLaughlin, Platelet interaction with a-C:H: Si thin films, Biomaterials (2003) In Press
6. Chhowalla M. Yin Y. Amaratunga G.A.J. McKenzie D.R. Frauenhein Th. Diamond Relat. Mater. 6 1997 207-211
7. Baikie I.D. Estrup P.J. Rev. Sci. Instrum. 69 1998 3902-3907
8. Zhao J.F. Lemoine P. Liu Z.H. Quinn J.P. McLaughlin J.A. J. Phys. Condens. Matter 12 2000 9201-9213
9. Martino C. Demichelis F. Fusco G. Tagliaferro A. Diamond Relat. Mater. 5 1996 461-465
10. Martino C. Fusco G. Mina G. Tagliaferro A. Vanzetti L. Calliari L. Anderle M. Diamond Relat. Mater. 6 1997 559
11. Fanchini G. Ray S.C. Tagliaferro A. Diamond Relat. Mater. 12 2003 891-899